17th International Fiber and Polymer Research Symposium

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INVESTIGATION OF CAPACITIVE PROPERTIES OF ALD THIN FILM COATED FABRICS

Authors :

Aleyna NİŞANCI¹ Halil İbrahim AKYILDIZ²

1- Bursa Uludag University 2- Bursa Uludag University

Keywords :

ALD،capaticance،thin film coating،Al2O3،Cotton،PET

Abstract :

Thin film deposition methods have advanced significantly in recent years. The ALD (atomic layer deposition) method is one of the chemical vapor deposition (CVD) methods and is a thin film coating method used for the production of semiconductor materials in recent years. (1) The features that distinguish the ALD thin film coating method from the CVD method are that all precursors are not fed into the system at the same time and the cleaning process after the precursors. The thin films formed by the ALD method have the same thickness across the entire surface and thus a conformal coating is realized. Although initially working with fabric, which is a conventional textile material, ALD film coating enables the fabric to gain new functional properties by modifying the fabric. In this way, it becomes a more technical material, has higher added value, and has the potential to be ready for use in different multidisciplinary fields other than textiles compared to fabric with the same properties without coating. In this study, the changes in the capacitance values of plain weave cotton and polyester woven fabrics with Al2O3 coating and surface modification by ALD thin film method were investigated.